Diagnosis and Cleaning of Carbon Contamination on SiO₂ Thin Film

Abstract

  A contamination on a surface is a serious problem in thickness measurement especially for thin films less than ten nanometers. Water contact angles are sensitive to the surface condition and the degree of contamination and can be a very useful criterion for a judgment of the effect in practical cleaning processes. The UV-ozone cleaning is the most effective one in removal of carbon contamination in the method we investigated.