Abstract
Surface analysis methods are widely used during the fabrication process of advanced devices. For practical applications in advanced industries, surface analysis methods should be standardized by the establishment of traceability and with the development of measurement procedures and certified reference materials. Measurement traceability for surface analysis is established by key comparisons (KCs) by the Surface Analysis Working Group (SAWG) of the Consultative Committee for Amount of Substance (CCQM). Thus far, two KCs for thickness measurements of nm SiO2 films (K-32) and for analyses of the atomic fractions of Fe-Ni alloy films (K-67) have been performed. International standards for surface chemical analysis procedures have been developed by ISO/TC-201. Fifty nine international standards have been published. The Korea Research Institute of Standards and Science (KRISS) has participated in key comparisons of the CCQM SAWG as the national metrology institute (NMI) of Korea. KRISS has also participated in ISO/TC-201 to develop international standards for surface analysis using XPS, AES and SIMS. Three types of thin-film certified reference materials have been developed by KRISS.
