Pattern Instrnmentation (I)

Development of Pattern Instrumentation System

Abstract

Three dimensional pattern instrumentation system was developed for fundamentals of pattern recognition of plant and soil. This system is constructed with measurement of reflection from specimen surface and computer controlled cubic scanning.
Reflected light through the lens system is detected by the photo-sensitive devices like photo-transistor or photo-conductive element at the precisely regulated temperature. Sensor temperature is regulated within the variation of 0.002 deg, by the thermo-electric device.
Scanning made by the three four-phase pulse motors is in the region of 60mm×30mm plane and the depth of 47mm with the minimum step unit of 45 micron, 12.5 micron and 15 micron, respectively. Measured data acquisition and scanning control are made by the same on-line computer and automated instrumentation is completed. This system has also the capability of photodensitometer for the transparent specimen.