Abstract
The reactivity of fused silica glass (SiO2) with plasma irradiation was investigated using argon gas sheet plasma in order to examine the suitability of this material for semiconductor and nuclear fusion application. The surface of the samples was evaluated using scanning electron microscope (SEM) and noncontactive three-dimensional roughness meter (ZYGO). Surface deterioration was observed by the plasma irradiation with decreased Ar gas flow rate. It was able to suppose this reason, the electron density in sheet plasma increased with decreasing Ar gas flow rate.
