Preparation of MgO thin films by ion plating process

Masato HASHIMOTO; Masaru HASHIMOTO; Kensuke YAMAMOTO; Tomotaka SUMI; Yoshihito MATSUMURA

doi:10.2978/jsas.11.2_97

Masato HASHIMOTO, Masaru HASHIMOTO, Kensuke YAMAMOTO, Tomotaka SUMI, Yoshihito MATSUMURA

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Keywords: Ion-plating, O₂ gas pressure, MgO thin films

JOURNAL FREE ACCESS

1999 Volume 11 Issue 2 Pages 97

DOI https://doi.org/10.2978/jsas.11.2_97

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Abstract

MgO thin films are applied to the protective layer of plasma-dispray devices, because of high secondery electron emission and low sputtering rate. In this study, We investigated the formation of MgO thin films by ion-plating process. The MgO thin films by ion-plating process showed high transparency and high deposition rate.

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