Abstract
Oxidization durability and light transitivity for a carbon protective layer developed in this research using a bias sputtering method are described. The light transitivity is estimated as 90% when the carbon protective layer was deposited with the condition of 250°C on the glass substrate. A surface roughness was measured as 0.39nm (RMS) within 10μm range. The roughness is improved taking a figure up one place compared with conventional sputtering method. The oxidization durability of the carbon protective layer of 5nm thickness was attained as the 10nm thickness carbon protective layer by the conventional sputtering has similar characteristics oxidization durability. Fabrication method of the carbon protective layer by the bias sputtering is effectively used for a near field optical data storage media.
