2020 Volume 64 Issue 3 Pages 152-157
In the double-sided polishing of glass substrates using suede pads, the polishing rate gradually decreases with polishing time. It was assumed that the pad surface properties affect the friction coefficient. This study was performed to verify the effects of the contact rate by contact image analysis using a prism. In a continuous 6-batch polishing test using a single-sided single-wafer polishing machine with a suede pad, it was confirmed that the contact ratio increased markedly as the number of batches progressed. The extreme increase in contact ratio reduces the friction coefficient and decreases the polishing rate by reducing retention of the slurry containing abrasive grains at the polishing interface.
