2024 Volume 68 Issue 1 Pages 26-32
As large grains easily settle in liquid, in some cases it is difficult to supply such grains to the area of a workpiece surface to be polished by abrasive polishing. The settling of large abrasive grains can be prevented by adding carboxymethylcellulose sodium (CMC-Na) to the polishing liquid. In this study, a light transmittance measurement device was developed to evaluate the settling characteristics of abrasive grains in CMC-Na aqueous solution. Using this device, we measured the changes in light transmittance over time for the suspension of green silicon carbide (GC) grains #600 in 0-1.0 wt% CMC-Na aqueous solution. The measurements showed that higher CMC-Na concentration reduced the settling of GC grains. To investigate the effectiveness of adding CMC-Na on the removal rate of polishing, acrylic resin flat plates were polished with a subaperture polishing tool in the polishing liquid, namely, a suspension of GC grains #600 with and without 1.0 wt% CMC-Na. The results demonstrate that the removal rate with CMC-Na is higher than that without it.
