Transactions of the Japan Society for Computational Engineering and Science
Online ISSN : 1347-8826
ISSN-L : 1344-9443
Three-Dimensional Dislocation Density Analysis of InP Bulk Single Crystal during Ingot Annealing Process
Noriyuki MIYAZAKIAkihiro KUMAMOTO
Author information
JOURNAL FREE ACCESS

2002 Volume 2002 Pages 20020024

Details
Abstract
Ingot annealing is indispensable process for InP single crystal to improve its electric characteristics. One of the technical problems of InP ingot annealing is the increase of dislocation density during its annealing process that affects the performance of electronic devices. A computer code was developed for dislocation density evaluation of a single crystal ingot during annealing process. A dislocation kinetics model called the Haasen-Sumino model was used as a constitutive equation. In this model, creep strain rate is related to the dislocation density, and this model was extended to the multiaxial stress state based on the theory of crystal plasticity. Three-dimensional finite element model was used to take account of crystal anisotropy in elastic constants and specific slip directions. Dislocation density analyses were performed for an InP ingot with 4-inch diameter, and time variations of dislocation density and stress were obtained from this computer code.
Content from these authors
© 2002 The Japan Society For Computational Engineering and Science
Previous article Next article
feedback
Top