Abstract
Fe-Al-Si-Ni magnetic films with a thickness of 1μm were deposited on crystallized-glass substrates by rf magnetron sputtering, and the changes in magnetic properties and microscopic structural changes in the films due to the annealing were investigated. The films annealed at 500°C exhibit excellent soft magnetic properties as for recording head materials. Furthermore, the films with high saturation magnetic-flux densities of 1.48T were obtained. It was found through conversion electron Mössbauer spectroscopy that the disorder structure of α-type in as-sputtered films transforms into the ordered structure consisting of a mixture of B2-and DO3-types at the temperature of 500°C.
