JSME International Journal Series A Solid Mechanics and Material Engineering
Online ISSN : 1347-5363
Print ISSN : 1344-7912
ISSN-L : 1344-7912
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Evaluation of Internal Stresses in Single-, Double- and Multi-Layered TiN and TiAlN Thin Films by Synchrotron Radiation
Takao HANABUSAKazuya KUSAKATatsuya MATSUEMasayuki NISHIDAOsami SAKATAToshiki SATO
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2004 Volume 47 Issue 3 Pages 312-317

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Abstract

Residual stresses in TiN and TiAlN films on steel substrate were investigated by ultra high X-rays of synchrotron radiation. The specimens prepared in this study were single-, double- and multi-layer TiN and TiAlN films deposited on high speed steel substrate by arc-ion plating. The minimum thickness available for the residual stress measurement was 0.8µm by in-lab equipment whereas below 0.1µm by synchrotron radiation. Extremely large compressive residual stresses were found in the films. Residual stresses in TiAlN films were more than twice larger than those in TiN films, resulting to reduce the average residual stress in the whole film system by making double- or multi-layer film construction comparing to that in the single TiAlN film.

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© 2004 by The Japan Society of Mechanical Engineers
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