The Proceedings of The Computational Mechanics Conference
Online ISSN : 2424-2799
2006.19
Session ID : 121
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121 Optimization of mask configuration for thinfilm thickness uniformity in vapor deposition equipment
Ryuichi TERAMOTOSeiji ONOUEOsamu YAMAZAKIShigeyuki TAKAGI
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© 2006 The Japan Society of Mechanical Engineers
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