The Proceedings of The Computational Mechanics Conference
Online ISSN : 2424-2799
2006.19
Session ID : 283
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283 A Molecular Dynamics Study of the Sputtering Properties on Amorphous Carbon
Hirotsugu WARABINOYasutaka YAMAGUCHITakehiko INABA
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CONFERENCE PROCEEDINGS FREE ACCESS

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Abstract
By using molecular dynamics method, helium, neon, and argon ion impacts on an amorphous carbon are simulated for the acceleration energy E_a ranging from 10 to 800eV in order to investigate the sputtering properties. The sputtering yield and probability increase linearly to the acceleration energy for around E_a≤200eV and saturate for E_a>200eV while the penetration depth is simply proportional to the acceleration energy. The sputtering yield and probability take the maximum for the incident angle around 25 to 40 degrees where the energetic ion may stir the target around the surface.
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© 2006 The Japan Society of Mechanical Engineers
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