2022.60
Session ID : 05a2
Conference information
Host: The Japan Society of Mechanical Engineers
Name : [in Japanese]
Date : March 04, 2022
Formation mechanism and control method of the spiral vortex formed in Semiconductor Wafer Cleaner
Keywords:
Single wafer cleaner,
Large-scale vortices,
Rotating-stationary disks,
Bödewadt layer,
Computational Fluid Dynamics
Details
Article 1st page
