F2-2 Challenges on Precise Patterning of Plasma Etching
Keywords:
Plasma Etching,
Charge-up Damage,
Pulse-time-modulated Plasma,
Dissociation, UHF Plasma,
PFC,
Radical Injection
Details
To breakthrough the problems in ULSI devices, three novel etching techniques, such as (1) pulse-time-modulated plasma, (2) ultra-high frequency plasma source with a spokewise antenna, and (3) a new radical-injection-method with non-perfluorocarbon gas chemistries, have been developed. This paper reviews the role of these techniques.
