Abstract
For shortening of surface cleaning time in semiconductor device fabrication, it is necessary to understand the liquid infiltration characteristics into tip-closed microstructures. In this study, we observed the liquid infiltration characteristics on miri- and micro-scale closed end by applying pressure under two conditions, i.e. quasi-static, and stepwise changes. As a result, we found that the effect of wettability of the tubes are limited, and the amount of dissolved air was very small. In addition, we confirmed that the time change of water level by applying pressure could be well expected to model by using the expression of isothermal process.
