Abstract
To elucidate the cause of increase in shear resistance in alignment process for nano imprint lithography (NIL), by using vertical-objective-type ellipsometric microscopy (VEM) combined with a micro-cylinder structure and gap feedback-control, shear response of nano-confined liquid film mimicking a NIL resist film were measured. The three kinds of samples were prepared; monomer, monomer with release agent, and monomer with polymerization initiator. The increase in the shear resistance force was not detected with the monomer alone, but with the addition of additives. The shear response waveforms indicated that the resist solidifies at nanometer gaps and may melt above the yield shear force. These results suggest that the additive is unevenly distributed near the sliding solid surfaces and changes the physical properties of the monomer near the solid surfaces, resulting in a significant increase in shear resistance force at the nano gaps. This mechanism is thought to be responsible for the increased shear resistance force in the NIL alignment process as well.
