Abstract
Although semiconductor device has been developed by design rule scaling and wafer size enlarging, there are still many difficult challenges such as new material introduction, 3D integration etc. Problems and developments in 45nm device are introduced herein as Paradigm Shift 45. Now is the time to challenge 20nm devices. There are many new challenges in 20nm device such as thin and conformal liner integration. Etc. Those problems are introduced as Paradigm Shift 20.
