The Proceedings of Conference of Kyushu Branch
Online ISSN : 2424-2780
2016.69
Session ID : A-03
Conference information
A-03 The cleaning effect of High Pressure Jet to the Soft type CMP pad : The cleaning effect to residual silica regarding rotational speed and atomizing pressure
Yuta TOKUMOTO, Masashi KITAMURA, Syuhei KUROKAWA, Terutake HAYASHI, Hirokuni HIYAMA, Yutaka WADA, Chikako TAKATO
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Keywords: Chemical Mechanical Polishing, High Pressure Jet, Soft Pad, Pore, Residual Silica
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© 2016 The Japan Society of Mechanical Engineers
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