1102 Film Formation Mechanism in Alumina Coating by Large-area Electron Beam Irradiation

Abstract

In our previous studies, a thin alumina film formation was possible by a large-area EB irradiation using a alumina target tube. However, film formation mechanism has not yet been clarified. In this study, the influences of magnetic property and electrical conductivity of a jig supporting an alumina target tube on the film formation were investigated. The spectrum of plasma generated on the substrate surface was measured during the EB irradiation. The results indicated that the film was formed by sputtering target material with the plasma of workpiece material caused by EB irradiation, and the magnetic property of the jig greatly influences on the film formation.