Abstract
Nanoimprint lithography (NIL) is a major breakthrough for obtaining a nanoscale pattern at low cost because of its high resolution and simple process. Because the resolution of NIL depends on the features of the master mold, it is very important to prepare a fine mold. To fabricate a fine mold, we have developed a mechanical deformation technique that uses an elastic UV-curable resin. In this study, the deformation characteristics of a line and space (LS) pattern were examined. As a result, we succeeded in reducing the size of an LS pattern with a line width of less than 50 nm.
