The Proceedings of the Machine Design and Tribology Division meeting in JSME
Online ISSN : 2424-3051
2004.4
Session ID : 311
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Friction and Wear Characteristics of Silicon Oxide using an Atomic Force Microscope : Difference of Wear Mechanism between in Alkaline Solution and in Pure Water
Satoko SETAHitoshi HATTORI
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Abstract
Micro or nano-meter order silica process is an important technology for several industrial processes such as for semiconductor and for MEMS. The object of this investigation is to clarify the chemistry of silica process. Using Atomic Force Microscope (AFM), micro-tribological experiments were performed in alkaline solution and in pure water. The significant difference of wear mechanism between the two solutions has been obtained by comparison with their friction and wear characteristics.
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© 2004 The Japan Society of Mechanical Engineers
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