G040044 Combinatorial thin film deposition using New Facing Targets Sputtering (NFTS)

Abstract

The combinatorial deposition gives the desired material exploration more efficiently to have samples having various compositions. The combinatorial deposition with New Facing Targets Sputtering (NFTS) is useful to create the new materials. The new method of the material exploration is offered in this research. It took a survey of the change of the composition distribution with that of the depositing conditions in NFTS; the output power applied to the target material, Ar pressure in the apparatus, TS distance. In this process, the samples with gradient compositions were made and measured composition distribution. The change in the output power resulted in that of the composition range. The gradient composition is influenced a great deal by the changes in Ar pressure and TS distance.