Abstract
To date, a number of useful techniques for nanolithography and nanostructure fabrication based on atomic force microscope (AFM) have been studied and developed; they include mechanical modification, local anodic oxidation (LAO), and metal-assisted chemical etching of germanium (Ge) surfaces in water by using platinum (Pt)-coated AFM tips. However, the use of a catalytically active AFM tip for material removal process for silicon (Si) based on chemical etching strategy was never reported before. We propose a novel nanofabrication technique for Si based on highly localized chemical catalysis with a Pt-coated AFM tip. Nanoscale grooves can be fabricated on a Si surface at room temperature via Pt-assisted catalytic chemical etching in just water without adding any chemicals. In the process, we found that dissolved oxygen present in the water must be a key element to drive the chemical reaction of Si with water. In addition, the oscillating cantilever must be required to overcome oxygen mass transfer limitations.
