The Proceedings of Mechanical Engineering Congress, Japan
Online ISSN : 2424-2667
ISSN-L : 2424-2667
[volume title in Japanese]
Session ID : J2210103
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Effect of Deposition Voltage on Tensile Properties of Single Crystal Silicon Microstructure Fully Coated by Plasma CVD DLC Film
*Wenlei ZHANGAkio UESUGIYoshikazu HIRAIToshiyuki TSUCHIYAOsamu TABATA
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Abstract

This paper reports on the effect of deposition bias voltage on tensile properties of single crystal silicon microstructure fully coated by plasma CVD diamond like carbon (DLC) film. DLC film with the thickness of 150 nm was uniformly coated on silicon microstructure of 120 μm long, 4μm wide and 5 μm thick. The result shows that by increasing of bias voltage, sp2 phase and hydrogen content decreased, while sp3 phase increased. The average tensile strength of DLC coated structure shows 13.2-29.6% higher values compared to that of the bare silicon structure and the -400 V bias voltage gave the highest strength of 3.94 GPa. Moreover, the Weibull modulus increased with higher bias voltage, which indicates smaller deviations in strength.

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© 2017 The Japan Society of Mechanical Engineers
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