The proceedings of the JSME annual meeting
Online ISSN : 2433-1325
2002.2
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Detection of Stress Shielding Effect at Elevated Temperature in Silicon Nitride Using Digital Image Correlation Method
Izuru NISHIKAWAKeiji OGURAShinya KUNIMATSU
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Pages 173-174

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Abstract

Distribution of COD in Silicon Nitride was measured at room temperature using Digital Image Correlation Method after cyclic bending fatigue tests. The cyclic fatigue tests with moving crack and stationary crack were performed under stress ratios R=0.1,0.5 and -1 at room temperature and 1273K. From the experimental results, the stress shielding effect under cyclic loading was discussed quantitatively. The stress shielding effect after the test at 1273K was more significant than that at room temperature under any stress ratio. Though the stress shielding effect under R=-1 was stronger than that under R=0.1 at room temperature, results obtained after the test at 1273K were found to be quite different.

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© 2002 The Japan Society of Mechanical Engineers
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