Precision measurements of micro-patterned thin film thickness using nanometrological AFM

Abstract

Precision measurements of micro-patterned thin film thickness using the Nanometrological AFM were carried out. The Nanometrological AFM has a three-axis laser interferometer unit, and length standard-traceable calibration of small fine features can be operated in real scanning time. The micro-patterned thin films were fabricated by wet etching of thermally oxidized film and the thickness of thin films was checked by x-ray reflection measurement. Nominal thickness values of micro-patterned thin films were approximately 10,7,5 and 3nm respectively. Less than 0.5nm standard deviation of thickness was obtained using the Nanometrological AFM.