Characterization of the Thin HA Film Formed on Ti Substrate by Liquid Deposition Technique

Abstract

In the present study, liquid phase deposition method was employed to produce a dense crystalline HA film on titanium substrate in metastable calcium phosphate solution. A 100x10x0.02(mm)^3 titanium foil was employed as a substrate. Prior to HA coating, the substrate was immersed in 5M NaOH solution at 60℃ for 24h. The temperature of the substrate was kept constant at 50,60,and 70℃ by electrically heated with DC power source in metastable calcium phosphate solution. The X-ray diffractogram indicated that the film deposited on the titanium substrate was composed of HA. The amount of HA deposited during 3h-treatment increased with an increase in the substrate temperature from 50 to 70℃. These results suggests that the dense HA film can be formed by a simple chemical and thermal treatments. This technique is useful especially to produce uniform HA coatings onto complex-shaped and porous dental implants.