Three-dimensional numerical simulation of droplet deposition
Details
The deposition process of a single droplet on the film is numerically simulated by the three-dimensional Moving Particle Semi-implicit (MRS) method to analyze the possibility and effect of splash occurring in the deposition process in the Boiling Water Reactor (BWR) condition. From the simulation results, it is found that the splash plays an important role in the deposition and re-entrainment process in high quality conditions in BWR.
