The proceedings of the JSME annual meeting
Online ISSN : 2433-1325
2006.1
Session ID : 3951
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3951 Microstructure and Mechanical Properties of Electroplated Copper Thin Films
Kinji TAMAKAWAHideo MIURA
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Abstract
Young's modulus of electroplated copper thin films was measured by using a tensile test and a nano-indentation method. The anisotropic Young's modulus was measured in the films, i.e., 20-45GPa in a horizontal plane and 60-90GPa along the thickness direction. The films consisted of mixture of large columnar grains with about 5μm diameter and small grains with about 0.5μm diameter.
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© 2006 The Japan Society of Mechanical Engineers
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