2517 Giant magnetostrictive films for micro-moving technology
Details
Influences of electron beam (EB) irradiation on magnetostriction and its susceptibility of Fe_<2.6>Sm alloy thin films have been investigated. The alloy thin film deposited on a (100) plane of silicon wafer is prepared by using direct current magnetron sputtering apparatus. The irradiation enhances compressive magnetostriction and its susceptibility. The enhancement of magnetostriction is caused by decreasing in the volume fraction of low magnetostrictive crystalline phase, resulting in generating the large magnetostriction. The high susceptibility is explained by randomization, induced by EB-irradiation, of Fe_<2.6>Sm amorphous sample, which is easy to rotate the magnetic moment.
