Abstract
The method by controlling a magnetic field as one of the methods of making composition control of Ti-Ni sputtering thin film was invented. This method is controlled the sputtering area of Ti and Ni by controlling a magnetic field using Ti-Ni/Ni compounding target. The control of a magnetic field was carried out with solenoid coil and the target has been arranged to the center of a coil. The variation of magnetic field is controlled by the input current. In this study, the composition of Ni decrease with increasing of input current, and composition control is possible in the range Ni concentration is 49-55at%. So that it turns out that control of composition is possible at controlling of the magnetic field. However, the thin film became brittle by the increase of input current. It is thought that this is for decreasing the kinetic energy of the sputtering atoms (Ti and Ni-atoms) by magnetic field.
