Abstract
This paper describes the fabrication methods nano-scale patterns composed of two kinds of materials. Fabrication methods are as follows: first, microscale pattern of the periodic slope array is fabricated on a substrate; second, multilayer films are deposited by physical vapor deposition (PVD) process; finally, the substrate is polished and the film materials appear on the surface as parallel stripes. The microscale pattern was fabricated on single crystal silicon substrate using photolithography and anisotropically etching techniques, The combinations of Fe-Au, platinum and aluminum (Pt-Al), alumina and aluminum (A1_2O_3-Al), and Si carbide and carbon (SiC-C) were deposited. The target thickness of each layer was 50 nm to 300 nm. During the polishing or by an additional etching, one material became higher than the other material. Thus, nanoscale ridge array could be formed.
