G1100-1-2 Local Anodic Oxidation Process with Water in Lubricant Layer

Abstract

We have developed new micro surface processing techniques of Si by local anodic oxidation by chemical etching through silicon oil with water at the interface. After drawing micrometer-order SiO_2 mask thin film, line pattern more than 1 μm height at the Si surface was obtained through wet etching in KOH solution. The thickness of the mask film is estimated to be about 6 nm. In addition, we found that this process can be applicable for visualizing the trace of stick-slip vibration on Si.