Two-dimensional simulations of gas flow inside a plasma reactor of parallel-plates RF etcher are performed using the direct simulation Monte Carlo (DSMC) method, In order to couple the outlet gas pressure to the pressure range of the pumping field, the outlet model of gas area filled with virtual gas particles is used. In this model, the virtual particles are set at random points and at random velocity estimated by the Maxwell-Boltzmann distribution for those pressure and temperature. Those are characterized effective only as the target of collision pairs and those tracking is not functional. The number density of gas(BCl3) is calculated on computational conditions of the outlet boundary, which are estimated by the reflectivity depending upon the number of the gas layers.