The Proceedings of the Materials and Mechanics Conference
Online ISSN : 2424-2845
2012
Session ID : OS2116
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OS2116 Evaluation of accumulative damage under random load by a stress measurement method using electroplated thin copper films
Kinji TAMAKAWANaokazu MURATAKen SUZUKIHideo MIURA
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Abstract
The change of the microtexture of the electroplated copper thin films was applied to the evaluation of the accumulative damage under random load. The micro texture of the electroplated copper thin film at the edges of micro slits formed in the film was found to change as a function of the amplitude of the applied cyclic loading. The life of the change was expressed by the modified Miner's law wlich is applied to the evaluation of the accumulated damage of materials under fatigue loads. Thus, it is possible to apply this method to the evaluation of the accumulated load
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© 2012 The Japan Society of Mechanical Engineers
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