Host: The Japan Society of Mechanical Engineers
Name : [in Japanese]
Date : October 08, 2016 - October 10, 2016
Physical properties of electroplated copper thin film used for interconnection materials of devices have a wide distribution in the manufacturing process. In this study, effects of the microtexture of a seed layer on mechanical properties and crystallinity of an electroplated copper thin film were investigated. It was found that quality of the atomic arrangement and crystallographic orientation of the electroplated thin film changed drastically depending on the microtexture of a seed layer. As a result, hardness and Young’s modulus of the electroplated thin film varied from about 1.1 to 2.6 GPa and 115 to 150 GPa, respectively.
