Abstract
The nanoimprint lithography is one of the newly developed techniques to produce the nano/micro patterns easier than the MEMS process. Under such circumstances, simpler method for the production of nanoimprint molds is explored. This study aims to produce nano-patterns by using the combination of local anodic oxidation (electrical method) and scratching (mechanical method) to support such a demand. In this report, influences of local anodic oxidation conditions and scratching conditions for nano-patterns formation were evaluated. Formation of nano-patterns by combination of local anodic oxidation and scratching was also performed.
