The Proceedings of the Symposium on Micro-Nano Science and Technology
Online ISSN : 2432-9495
2012.4
Session ID : P-OS4-1
Conference information
P-OS4-1 Biased Electret Charging Method for SiN/SiO_2 of High Thermal Robustness Electret Film
Toshikazu OnishiTakayuki FujitaKohei FujiiHiroyuki KatsumaKensuke KandaKohei HiguchiKazusuke Maenaka
Author information
CONFERENCE PROCEEDINGS FREE ACCESS

Details
Abstract
In this study, an electret charging method for fabricating energy harvester with SiN/SiO_2 film that is selectively charged by using biased electrodes is demonstrated. Inorganic material of SiN and SiO_2 have high thermal robustness to endure the soldering temperature and the electret charging method by using the biased electrode doesn't require physical patterning of the electret film. Our charging method to SiN/SiO_2 film, a fine patterned electret with highly thermal robustness is obtained.
Content from these authors
© 2012 The Japan Society of Mechanical Engineers
Previous article Next article
feedback
Top