Abstract
We developed a novel technique for patterning a SAM (Self-assembled monolayer) using VUV (Vacuum ultra violet) light irradiation. First, after a SAM of ODS (octadecyltrimethoxysilane) was formed on a SiO_2-coated Si substrate, its surface was irradiated with VUV light for several different lengths of time. Then, in order to find irradiation time required for complete removal of the SAM, the wettability of the surface was analyzed by measuring contact angles of a droplet on it, and the carbon content at the surface was analyzed using XPS (X-ray photoelectron spectroscopy). Moreover, a SAM of AHAPS (n-(6-aminohexyl)aminopropyltrimethoxysilane) was patterned by irradiation of VUV light through a quartz glass plate having line and space patterns, and the patterning accuracy was evaluated by binding fluorescent dyes to remaining AHAPS molecules.
