Abstract
Moire method was introduced by Weller in 1948 and has been improved by many researchers. The classical Moire method, referred to as geometric or coarse Moire has been widely used in experimental stress and strain analysis. Therefore authors have developed an electron Moire method which can be detected the micro-deformation of the specimen. The model grids for this method were fabricated by an electron beam lithography and photo-lithography. Recently, femtosecond laser exposure has been used for fabricate micro-size devices which size is a few micro-meters. In this study, a model grid for an electron Moire method and a scanning laser Moire method were fabricated by a femtosecond laser exposure systems. These model grids were tried to be used for observation of the micro Moire fringe.
