Proceedings of thermal engineering conference
Online ISSN : 2433-1317
2001
Session ID : TF-7I/E110
Conference information
E110 Effects of Surface Characteristics of Silicone Wafer on Temperature History of Wafers in Thermal Treating Furnaces
Akeno MOCHIDAKazuhiko KUDOYukio HISHINUMAToshimitu MIYATAKenji ONO
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CONFERENCE PROCEEDINGS FREE ACCESS

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Abstract
Considering the optical characteristics of silicone wafer, the transient radiative heat transfer analyses based on gray assumption were applied to rapid-heating process. The results show that regularity and transparency of wafer surface give a slight reduction in the wafer temperature distribution in one side.
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© 2001 The Japan Society of Mechanical Engineers
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