The Proceedings of the Thermal Engineering Conference
Online ISSN : 2424-290X
2012
Session ID : J125
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J125 Deployment to the numerical simulation of the TiN deposition model by a thermal CVD method
Yuya HatoriKen-ichirou TanoueHiroki YamamotoTatuo NishimuraYuken Iwamoto
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Abstract
In this study, numerical simulation for titanium-nitride (TiN) coating in the tubular reactor by thermal CVD has been conducted. Growth rate profile of TiN along the axial position of the reactor was predicted by solving two dimensional heat and mass transfer equations with having the effects of solidification in the gas phase and surface reaction under Poiseuille flow condition. The analyzed rate constants for the solidification in the gas phase and surface reaction were used. The calculated profile agreed qualitatively with the experimental results for the dependence of the setting temperature. However, the dependence of the growth rate on the total flow rate into the reactor could not be explained by the calculation.
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© 2012 The Japan Society of Mechanical Engineers
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