The Proceedings of Conference of Tohoku Branch
Online ISSN : 2424-2713
2011.46
Session ID : 162
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162 Fabrication of optical controlled micro electron source allay for next generation electron beam lithography
Yujiro Tanaka, Eiichi Tomono, Hidetoshi Miyashita, Takahito Ono
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Keywords: multi EB lithography, electron emission, MEMS, emitter array, optically control
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© 2011 The Japan Society of Mechanical Engineers
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