Journal of Japanese Society of Oral Implantology
Online ISSN : 2187-9117
Print ISSN : 0914-6695
ISSN-L : 0914-6695
Clinical Course of Implants Placed in Patients with Diabetes Mellitus
Hideaki TAKAHASHIYoshiro MATSUIAyako AKIZUKITatsuo SHIROTAKohsuke OHNOSoo-Taek KIMYuji SATOHajime MIYASHITA
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2004 Volume 17 Issue 3 Pages 345-350

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Abstract

Diabetes mellitus (DM), one of the world's widespread chronic diseases, is not regarded today as an absolute contraindication for implant surgery. However, little data is available concerning the clinical outcomes involving the use of implant treatment for patients with DM. This study investigated the clinical course of patients who had undergone implant therapy in our institution to clarify the key points of the maneuver.
Seven patients with Type II diabetes mellitus (mean age:65.6 years, range:52-76 years) participated in this retrospective study, and in whom a total of 24 Branemark or HA-coating implants had been placed. The follow-up period after implant placement ranged from 12 to 96 months (average 4 years and 8 months).
The survival rate was assessed using the Kaplan-Meier test and compared statistically with our data of controls. Probing depth (PD) was also evaluated during the follow-up period.
The results obtained were as follows:
1. There were no severe postoperative complications.
2. Only one implant, placed in a patient with uncontrolled DM, failed to osseointegrate at the second surgery.
3. The survival rate was 86.7% at 60 months. A statistical difference (p<0.05) existed between the controls: the corresponding survival rate was 94.7%.
4. No statistical difference existed when the uncontrolled patient's data were omitted:the survival rate increased to 89.7%.
5. Average PD decreased gradually during the follow-up period. Two implants that failed during the follow-up period did not have large PD just before the failure.
These results suggested that diabetic control is essential for osseointegration of the placed implants. Periodical close examination is very important during the follow-up period.

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© 2004 Japanese Society of Oral Implantology
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