Journal of Japanese Society of Oral Implantology
Online ISSN : 2187-9117
Print ISSN : 0914-6695
ISSN-L : 0914-6695
Application of Capacitively Coupled Electric Field to Oral Implants
Morio OchiHiroyuki KagamiKunihiko Sakaguchi
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JOURNAL FREE ACCESS

1996 Volume 9 Issue 1 Pages 74-80

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Abstract
Measures to promote osteogenesis during bone repair after the placement of endosseous implants may shorten the period required for initial implant fixation and thereby permit early seating of the superstructure. Prosthodontically, this may provide significant benefits by promoting early restoration of the patient's occlusion. A capacitively coupled electric field (CCEF) was used to promote osseointegration around titanium alloy implants placed in the distal end of the femur of adult rabbits to investigate how effective CCEF stimulation was on peri-implant osteogenesis.
The results were as follows
1. Observation by fluorescent labeling, basic fuchsin-methylene blue double-stain and CMR revealed more newly-formed bone in drilled holes in the stimulated group than in the control group.
2. Fluorescence labeling studies indicated that with time new bone was formed in the direction from the existing bone towards the implant surface in both groups.
3. The results of CMR image analysis demonstrated that the rate of contact between bone and the implant surface was significantly higher in the stimulated group than in the control group (p<0.001).
4. CMR image analysis also indicated that the level of osteogenesis in the drilled holes was significantly higher in the stimulated group than in the control group.
The results suggested that CCEF may be therapeutically useful in oral implantology.
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© 1996 Japanese Society of Oral Implantology
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