Journal of Plasma and Fusion Research
Print ISSN : 0918-7928
Lecture Note : Invitation to the World of the Plasma for Light Sources
Invitation to the World of the Plasma for Light Sources 4.Light Source for 21st Century 4.1 EUV (Extreme Ultra-Violet) Light Source
Kazuaki HOTTA
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Keywords: EUV (Extreme Ultra-Violet), EUV lithography (EUVL), 13.5 nm, DPP (Discharge Produce Plasma), LPP (Laser Produce Plasma), Xe, Sn, debris, debris mitigation
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2005 Volume 81 Issue 12 Pages 1007-1009

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Abstract
EUV lithography with a 13.5nm EUV (Extreme ultra-violet) light source is the strongest candidate of the next generation lithography for LSI. EUV is obtained from a high temperature and high density plasma by DPP (Discharge Produce Plasma) and LPP (Laser Produced Plasma).
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© 2005 by The Japan Society of Plasma Science and Nuclear Fusion Research
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