Journal of Plasma and Fusion Research
Print ISSN : 0918-7928
Special Topic Article : Present Status and Issues of Carbon Nanotubes Aligned Growth Using Plasma Process
Present Status and Issues of Carbon Nanotubes Alighned Growth Using Plasma Process 4. Synthesis of Aligned Single-Walled Carbon Nanotubes by Point-Arc Microwave Plasma Chemical Vapor Deposition
Takayuki IWASAKIGoufang ZHONGIwao OHDOMARIHiroshi KAWARADA
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2005 Volume 81 Issue 9 Pages 665-668

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Abstract
It is very important to control the growth orientation of carbon nanotubes (CNTs) on substrates for applications such as field emission devices and CNT-based FETs. Although chemical vapor deposition (CVD) is the most reliable means to this end, there have been few reports on the synthesis of vertically aligned single-walled carbon nanotubes (SWNTs) using the CVD method. In this study, we demonstrate the low temperature synthesis of extremelydense and vertically aligned SWNTs deposited by point-arc microwave plasma CVD.
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© 2005 by The Japan Society of Plasma Science and Nuclear Fusion Research
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