Abstract
It is very important to control the growth orientation of carbon nanotubes (CNTs) on substrates for applications such as field emission devices and CNT-based FETs. Although chemical vapor deposition (CVD) is the most reliable means to this end, there have been few reports on the synthesis of vertically aligned single-walled carbon nanotubes (SWNTs) using the CVD method. In this study, we demonstrate the low temperature synthesis of extremelydense and vertically aligned SWNTs deposited by point-arc microwave plasma CVD.