1991 Volume 65 Issue 5 Pages 489-507
Plasma processing is nowadays one of key technologies to manufacture semiconductor devices such as large scale integrated electronic circuits and solar batteries and the field of its application is still expanding. However, chemical reactions in the plasma are quite complicated and their details are left unknown.
Further intensive studies on reactive plasmas must be encouraged for production of highly functional thin films and ultra large scale integrated circuits. Here, on the view point of a plasma physicist, challenging and interesting topics of great urgency to be solved and status of this technology in the future will be discussed.
