Hyomen Kagaku
Online ISSN : 1881-4743
Print ISSN : 0388-5321
ISSN-L : 0388-5321
Special Issue on Key Technologies for Next Generation Thin Film Silicon Solar Cells
Thin Film Si Solar Cell Fabricated at Low Temperatures
Kenji YAMAMOTO
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2000 Volume 21 Issue 5 Pages 272-277

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Abstract
Research and development of our thin film Si solar cells are reviewed. By combining a poly-Si cell with an a-Si cell both of which are fabricated by plasma chemical vapor deposition (CVD) at low temperatures, a stabilized efficiency of 12% has been achieved for a-Si : H/poly-Si/poly-Si cell structure. The stabilized efficiency of 11.3% has been achieved for 10 segments of a-Si/poly-Si stacked cell. The segments are monolithically interconnected in series and have an area of 25 cm2.
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この記事はクリエイティブ・コモンズ [表示 - 非営利 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by-nc/4.0/deed.ja
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